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PHOTORESIST MACHINING PROCESS APPLICATIONS
Our Photoresist Machining Process (PMP) uses abrasive etching to selectively remove a variety of brittle materials and coatings. Below is a partial listof the materials and coatings that can be photo machined:
  • Alumina
  • Alumina Silicate
  • Aluminum Nitride
  • Anodized Aluminum
  • Boron Carbide
  • Boron Nitride
  • Carbon Fiber
  • Ceramic Composites
  • Ferrite
  • Glass Variety of Plated/Painted Materials
  • Graphite
  • Mullite
  • Quartz
  • Silicon Carbide
  • Silicon Nitride
  • Steatite
  • Titanium Nitride
  • Zirconia
Detailed Etching: PMP can be used to micromachine detailed patterns and markings with a resolution up to 0.002" (50 µm).
Deep Etching: PMP can be used for relatively deep etch on lower density material.
Hole Drilling: PMP is well suited for creating thru-holes and patterns in thin materials. Blind holes are also possible. Fragile workpieces will not experience the chips or breakage associated with other machining methods.
Large Area Removal: PMP provides the ability to quickly remove significant material on a large workpiece. Work area or work piece size limitations inherent to CNC and ultrasonic machining are not an issue with Photoresist Machining.
Marking/Part Identification: Difficult to mark workpieces can be individually and indelibly identified using PMP.
Surface Texturing/Finishing: PMP can be used to abrade most surfaces to create unique surface patterns, prepare the surface for a future coating process and/or produce a variety of surface finishes.
Coating Removal: PMP offers the ability to selectively remove coatings generating detailed and complex patterns as required.
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